UMKA: SCANNING TUNNEL MICROSCOPE

UMKA-02-E: Training Nanotechnology Equipment



UMKA UMKA UMKA UMKA
LELL Enterprise, Ltd
105066, Russia, Moscow, N. Krasnoselskaya st., 35
Phone: +7-499-265-68-36

Please, send your inquiry in English to Mr. Igor Ivanov:
E-mail: ivanov@lell.ru
UMKA

Film removed from TOKAMAK walls
0.39 μm x 0.39 μm

UMKA-02-E has been designed to introduce students to and train them in nanotechnology techniques. Ease of handling and servicing, built-in vibration isolation and high intrinsic resonance frequency of the scanning head – all this allows employing the system both in research laboratories and in workrooms.

Main advantages:

  • high resonance frequency
  • enhanced vibrostability and interference protection
  • ease of handling and servicing
  • reliability and accuracy of results
  • high temperature stability
  • high scanning speed

Standard set comprises:

  • scanning head
  • control unit
  • software
  • User’s Guide
  • set of tools and test samples
  • data sheet
 
Specification:
 
Resolution Atomic, molecular
Scanning region 5 μm x 5 μm ± 3 μm
Scanning step in the plane of sample in full field / in 1:10 mode 0.08 nm/0.008 nm
Height range 1 μm ± 0.2 μm
Measurement step, Z-axis 0.02 nm and better
 
Adjusted parameters:
Tunnel gap voltage 0 V ± 2.3 V
Tunnel current 60 pA … 5000 pA
Tunnel gap voltage job (measurement) step 0.04 mV
Sample size 8 mm x 8 mm x (0.5 mm … 4 mm)
 
Signal parameters for tunnel gap modulation:
Waveshape optional program-based
Frequency 10 kHz … 100 kHz
Modulation depth ± (1 pm … 100 pm)
Image scanning time (3nm x 3nm), atomic resolution no longer than 7 sec.
Image scanning time (5μm x 5μm) no longer than 4 min.
Operating mode setup time no longer than 2 min.
 
System modes:
Constant current scanning mode
Constant height scanning mode
Surface volt-ampere characteristic measurement mode
Surface H-ampere characteristic measurement mode