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UMKA-02-E: Training Nanotechnology Equipment
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LELL Enterprise, Ltd
105066, Russia, Moscow, N. Krasnoselskaya st., 35
Phone: +7-499-265-68-36
Please, send your inquiry in English to Mr. Igor Ivanov:
E-mail: ivanov@lell.ru
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Film removed from TOKAMAK walls
0.39 μm x 0.39 μm
UMKA-02-E has been designed to introduce students to and train them in nanotechnology techniques. Ease of handling and servicing, built-in vibration isolation and high intrinsic resonance
frequency of the scanning head – all this allows employing
the system both in research laboratories and in workrooms.
Main advantages:
- high resonance frequency
- enhanced vibrostability and interference protection
- ease of handling and servicing
- reliability and accuracy of results
- high temperature stability
- high scanning speed
Standard set comprises:
- scanning head
- control unit
- software
- User’s Guide
- set of tools and test samples
- data sheet
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| Specification: |
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| Resolution |
Atomic, molecular |
| Scanning region |
5 μm x 5 μm ± 3 μm |
| Scanning step in the plane of sample in full field / in 1:10 mode |
0.08 nm/0.008 nm |
| Height range |
1 μm ± 0.2 μm |
| Measurement step, Z-axis |
0.02 nm and better |
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| Adjusted parameters: |
| Tunnel gap voltage |
0 V ± 2.3 V |
| Tunnel current |
60 pA … 5000 pA |
| Tunnel gap voltage job (measurement) step |
0.04 mV |
| Sample size |
8 mm x 8 mm x (0.5 mm … 4 mm) |
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| Signal parameters for tunnel gap modulation: |
| Waveshape |
optional program-based |
| Frequency |
10 kHz … 100 kHz |
| Modulation depth |
± (1 pm … 100 pm) |
| Image scanning time (3nm x 3nm), atomic resolution |
no longer than 7 sec. |
| Image scanning time (5μm x 5μm) |
no longer than 4 min. |
| Operating mode setup time |
no longer than 2 min. |
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| System modes: |
| Constant current scanning mode |
| Constant height scanning mode |
| Surface volt-ampere characteristic measurement mode |
| Surface H-ampere characteristic measurement mode |
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